
Reference: N10010
ODA INTENSIVE REGENERATING CREAM FOR NORMAL/OILY SKIN, 50 ml
Improves the skin's resistance-enhancing properties, stimulates collagen and elastin synthesis, stimulates regeneration of the skin.
Soothe irritated, dry, sensitive skin and protect it from cold, wind or sun. Especially suitable for facial skin affected by cold, wind, and hot sun, as well as after the skin peeling procedure with acid, when the facial skin is dry, sensitive, and irritated. Thanks to the active components contained in the product, skin sensitivity is reduced, and the moisture balance of the skin is restored.
ODA Recovery cream for sensitive/dry skin is enriched with ingredients, which restore natural moisture balance of the skin, help to recover and repair the skin's natural barrier against effects from cold-wintery, sun damage and all other environmental assaults. The rich Avocado and Almond oils soothe the skin, reduce irritation and stimulate regeneration of the skin after chemical peeling procedures containing organic acids.
How to use: In order to dissolve impurities and clean the face deeply, wash it with ODA Active Cleanser. Apply cream twice a day - morning and evening. Also use straight after chemical peeling procedures with organic acids: apply for the first 2-3 days.
Ingredients: Aqua, Glycine Soja Oil, Olea Europaea Oil, Prunus Amygdalus Dulcis Oil, Cera Alba, Persea Gratissima Oil, Cetearyl Olivate, Hydroxypropyl Starch Phosphate, Sorbitan Olivate, Butyrospermum Parkii Butter, Lecithin, Glycerin, Panthenol, Allantoin, Pueraria Lobata Symbiosome Extract, Aloe Barbadensi, Cetearyl Alcohol, Ceteareth-20, Zinc Oxide, Titanium Dioxide, Phenoxyethanol, Caprylyl Glycol, Chlorphenesin.
Presentation: 50 ml
Made in Lithuania, ODA
Reference: N10010
Improves the skin's resistance-enhancing properties, stimulates collagen and elastin synthesis, stimulates regeneration of the skin.
Reference: N30025
AzAheal® Cream with ceramide complex for the care of sensitive, red and acne-prone skin.
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AI Peptide Serum is a treatment that reduces sebum production, enlarged pores and promotes skin renewal.
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Reference: N70008
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Reference: N30022
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Reference: N70006
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Reference: N90002
MASK is designed for the active care of sensitive, problematic skin with a bright capillary network.
Soothe irritated, dry, sensitive skin and protect it from cold, wind or sun. Especially suitable for facial skin affected by cold, wind, and hot sun, as well as after the skin peeling procedure with acid, when the facial skin is dry, sensitive, and irritated. Thanks to the active components contained in the product, skin sensitivity is reduced, and the moisture balance of the skin is restored.