Reference: N500071
ODA RETINOL SERUM 0.3%
RETINOL SERUM 0,3% is an effective tool for reducing the visibility of wrinkles.
Soothe irritated, dry, sensitive skin and protect it from cold, wind or sun. Especially suitable for facial skin affected by cold, wind, and hot sun, as well as after the skin peeling procedure with acid, when the facial skin is dry, sensitive, and irritated. Thanks to the active components contained in the product, skin sensitivity is reduced, and the moisture balance of the skin is restored.
ODA Recovery cream for sensitive/dry skin is enriched with ingredients, which restore natural moisture balance of the skin, help to recover and repair the skin's natural barrier against effects from cold-wintery, sun damage and all other environmental assaults. The rich Avocado and Almond oils soothe the skin, reduce irritation and stimulate regeneration of the skin after chemical peeling procedures containing organic acids.
How to use: In order to dissolve impurities and clean the face deeply, wash it with ODA Active Cleanser. Apply cream twice a day - morning and evening. Also use straight after chemical peeling procedures with organic acids: apply for the first 2-3 days.
Ingredients: Aqua, Glycine Soja Oil, Olea Europaea Oil, Prunus Amygdalus Dulcis Oil, Cera Alba, Persea Gratissima Oil, Cetearyl Olivate, Hydroxypropyl Starch Phosphate, Sorbitan Olivate, Butyrospermum Parkii Butter, Lecithin, Glycerin, Panthenol, Allantoin, Pueraria Lobata Symbiosome Extract, Aloe Barbadensi, Cetearyl Alcohol, Ceteareth-20, Zinc Oxide, Titanium Dioxide, Phenoxyethanol, Caprylyl Glycol, Chlorphenesin.
Presentation: 50 ml
Made in Lithuania, ODA
Reference: N500071
RETINOL SERUM 0,3% is an effective tool for reducing the visibility of wrinkles.
Reference: N70001
Specially-designed to provide intensive hydration for dry, sensitive, thin skin with fine lines and wrinkles. It contains high and low mass hyaluronic acid molecules, which ensure improved skin hydration, and provide firmness and elasticity by stimulating the production of collagen and elastin.
Reference: N90003
Is intended for problematic skin prone to acne, oily, with enlarged pores.
Reference: N100121
Gently exfoliates, clarifies, and soothes skin while reducing imperfections, brightening tone, and supporting barrier strength.
Reference: N90002
MASK is designed for the active care of sensitive, problematic skin with a bright capillary network.
Reference: N70006
Is formulated to stimulate regeneration of the skin, soothe irritated skin and restore the healthy skin condition.
Reference: N400051
This product is designed as a daily facial cleanser.
Reference: N10010
Improves the skin's resistance-enhancing properties, stimulates collagen and elastin synthesis, stimulates regeneration of the skin.
Reference: N30014
Active ingredients contained in this product promote rapid skin regeneration, intensively moisturize the skin of the face, and protect it from harmful UVA/UVB rays. Other active components soothe the irritated facial skin after the acid peeling procedure.
Reference: N70008
Ultra-quick skin regenerator and soother, designed for all skin types, including irritated, dry and ultra-sensitive skin.
Reference: N70002
Slows down the synthesis of melanin, effectively whitens, softens the skin and reduces the depth of wrinkles.
Reference: N40008
Designed for daily care of mature skin, the formula's active components tighten and stimulate, promoting elasticity and encouraging skin function.
Reference: N30028
Provides broad-spectrum UVA/UVB defense, helps prevent premature aging and pigmentation, while hydrating and smoothing skin.
Reference: N50005
The cream is intended for oily, acne-prone skin.
Soothe irritated, dry, sensitive skin and protect it from cold, wind or sun. Especially suitable for facial skin affected by cold, wind, and hot sun, as well as after the skin peeling procedure with acid, when the facial skin is dry, sensitive, and irritated. Thanks to the active components contained in the product, skin sensitivity is reduced, and the moisture balance of the skin is restored.